基本信息
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个人简介
Research
Micro- and nanolithography, stochastic modeling of semiconductor lithography to predict line-edge roughness
Awards & Honors
SPIE Frits Zernike Award for Microlithography, for contributions in lithography modeling and education, 2009
SEMI Award for North America, for contributions in lithography modeling and education, 2003
Best Paper Award, 18th Annual BACUS Symposium on Photomask Technology and Management, 1998.
Micro- and nanolithography, stochastic modeling of semiconductor lithography to predict line-edge roughness
Awards & Honors
SPIE Frits Zernike Award for Microlithography, for contributions in lithography modeling and education, 2009
SEMI Award for North America, for contributions in lithography modeling and education, 2003
Best Paper Award, 18th Annual BACUS Symposium on Photomask Technology and Management, 1998.
研究兴趣
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