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The research group focuses on the fabrication and the study of the physical properties of novel complex oxide and chalcogenide materials using advanced growth and characterization techniques, including molecular beam epitaxy and synchrotron x-ray scattering techniques. Current interests include the physics and technology of multifunctional oxides and topological chalcogenides, nanofabrication and electronic writing using scanning probe microscopies, electronic control of complex order parameters in correlated oxides and selenides, and development of nonvolatile logic switches for post-CMOS computing paradigms.
The research group focuses on the fabrication and the study of the physical properties of novel complex oxide and chalcogenide materials using advanced growth and characterization techniques, including molecular beam epitaxy and synchrotron x-ray scattering techniques. Current interests include the physics and technology of multifunctional oxides and topological chalcogenides, nanofabrication and electronic writing using scanning probe microscopies, electronic control of complex order parameters in correlated oxides and selenides, and development of nonvolatile logic switches for post-CMOS computing paradigms.
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ADVANCED MATERIALS INTERFACES (2023)
Science advancesno. 27 (2023): eadh3327-eadh3327
ADVANCED ELECTRONIC MATERIALSno. 6 (2022): 2200146-2200146
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