基本信息
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Bio
Chao-Ching Cheng received the B.S. degree in electronic engineering from Chang Gung University, Tao-Yuan, Taiwan, in 2003 and the M.S. degree in electronic engineering from National Chiao Tung University, Hsinchu, Taiwan, in 2005, where he is currently working toward the Ph.D. degree related to Ge and III–V MOSFETs in the Institute of Electronics.
His main research interests include the study of the interface and device properties of Ge and III–V substrates integrating with high-$k$ materials, heteroepitaxial technology, and electrical characteristics of SiGe film on various III–V materials.
Research Interests
Papers共 71 篇Author StatisticsCo-AuthorSimilar Experts
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Meng-Zhan Li,Terry Y.T. Hung,Wei Sheng Yun, Sui An Chou,Chen-Feng Hsu, T.Y. Lee,Chao-Ching Cheng,Iuliana P. Radu,Minn-Tsong Lin
2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA)pp.1-2, (2024)
Yi-Xuan Chen, Yi-Lin Wang, Fu-Jyuan Li,Shu-Jui Chang,Tsung-En Lee,Chao-Ching Cheng,Meng-Chien Lee,Hui-Hsuan Li,Yu-Hsien Lin,Chao-Hsin Chien
IEEE TRANSACTIONS ON NANOTECHNOLOGYno. 99 (2024): 299-302
NANOTECHNOLOGYno. 12 (2024)
Yu-Tung Lin,Ching-Hao Hsu,Ang-Sheng Chou, Zi-Yun Fong,Chih-Piao Chuu,Shu-Jui Chang,Yu-Wei Hsu,Sui-An Chou,San Lin Liew, Ting-Ying Chiu, Fa-Rong Hou,I-Chih Ni,
Nano lettersno. 29 (2024): 8880-8886
Tsung-En Lee,Hung-Li Chiang, Chih-Yu Chang,Yuan-Chun Su,Shu-Jui Chang,Jui-Jen Wu, Bo-Jiun Lin,Jer-Fu Wang, Shu-Chih Haw,Shang-Jui Chiu, He-Liang Ching,Yan-Gu Lin,
2023 International Electron Devices Meeting (IEDM)pp.1-4, (2023)
Yun-Yan Chung,Wei-Sheng Yun,Bo-Jhih Chou,Chen-Feng Hsu, Shao-Ming Yu, G. Arutchelvan,Ming-Yang Li,Tsung-En Lee, Bo-Jiun Lin, Chen-Yi Li,Aslan Wei,D. Mahaveer Sathaiya,
2023 International Electron Devices Meeting (IEDM)pp.1-4, (2023)
2023 International Electron Devices Meeting (IEDM) (2023)
2023 International Electron Devices Meeting (IEDM)pp.1-4, (2023)
NANO LETTERS (2023)
Nano letters (2023)
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