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Research Interests

Papers共 167 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
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EUV source pole control for LCDU and CD ellipticity handling in hexagonal contact arrays
Jieun Song, Janghoon Kim,Hyung Jong Bae,Sudeok Kim, Soonmok Ha, Woojin Jung, Seokwon Cho, Jeounghun Park, Dohyeon Park, Eunji Lee, Minseung Song, Hyunseung Ha,
Optical and EUV Nanolithography XXXVII (2024)
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0
0
Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements
Jungmin Lee, Doogyu Lee,Eunji Lee, Inbeom Yim,Jeongjin Lee,Seung Yoon Lee,Chan Hwang,Marc Noot, Arno van Leest,Simon Mathijssen, Yao Gao,Seung-Bin Yang,
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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0
0
EPE-aware process optimization for scanner dose and overlay in DRAM use case
Inho Kwak, Nanhyung Kim, Inbeom Yim,Jeongjin Lee,Seung Yoon Lee,Chan Hwang, Pieter Brandt,Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh,Antonio Corradi,Yun-A Sung,
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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0
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Absolute overlay measurement with voltage contrast edge placement metrology
Moosong Lee,Jinsun Kim, Dohyeon Park,Yeeun Han, Junseong Yoon,Seung Yoon Lee,Chan Hwang,Achim Woessner,Cyrus E. Tabery, Miao Wang,Antonio Corradi,Young-Hoon Song,
Metrology, Inspection, and Process Control XXXVI (2022)
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0
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Improved multi-lot overlay performance via phase-based ADI overlay measurements
Doogyu Lee,Jungmin Lee,Eunji Lee,Jeongjin Lee,Seung Yoon Lee,Chan Hwang, Pieter Kapel,Seung-Bin Yang, Mi-Yeon Baek, Jeroen Wefers Bettink,Se-Ra Jeon,Thomas Kim,
Metrology, Inspection, and Process Control XXXVI (2022)
Cited1Views0Bibtex
1
0
Novel On-Product Focus Metrology For Euv Enabling Direct Focus Monitoring And Control For Euv Systems
Inbeom Yim, Koshiba Dakeshi,Chan Hwang,Seung Yoon Lee,Jeongjin Lee,Joon-Soo Park, Jenny Yueh,Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda,
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
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Author Statistics

#Papers: 168

#Citation: 4039

H-Index: 32

G-Index: 50

Sociability: 5

Diversity: 2

Activity: 9

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