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Research Interests

Papers共 46 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
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引用量
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期刊级别
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Qualification Of Small Alignment Mark By On-Product Overlay Performance
Jigang Ma, Frans Bijnen, Edo Hulsebos,Lukasz Macht, Sotirios Tsiachris, Jin Dai, Rob Van Der Meulen, Miao Yu,Paul Bocker,Jung-Hwan Kim, Hyun Kim,Gwang-Gon Kim,
OPTICAL MICROLITHOGRAPHY XXXIV (2021)
Cited0Views0Bibtex
0
0
Statistical process optimization method for metrology equipment
Dongsoo Kim, Moran Zaberchik,Chen Li,Honggoo Lee,Chanha Park,Sang Ho Lee,Dongyoung Lee, Scott Beatty, Jae Young Park,Ramkumar Karur-Shanmugam, Telly Koffas,Dohwa Lee,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 488-494
Cited0Views0Bibtex
0
0
Edge placement error wafer mapping and investigation for improvement in advanced DRAM node
Kuan-Ming Chen, Wolfgang Henke, Ji-Hoon Jung, Ewa Kasperkiewicz, Anita Bouma, Rizvi Rahman, Gratiela Isai,Gwang-Gon Kim, Sotirios Tsiachris, Jae-Doug Yoo, Yuna Park, JaeYoung Park,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 453-463
Cited2Views0Bibtex
2
0
Holistic Alignment Approach For On-Product Overlay Improvement On Duv Lithography Process With Combined Solutions
Jigang Ma, Miao Yu,Cees Lambregts, Sotirios Tsiachris,Paul Bocker,Jun-Yeob Kim, Won-Kwang Ma,Sang-Jun Han,Chan-Ha Park, Kyong-Seok Kim,Jung-Hwan Kim, Sang-Jun Park,
OPTICAL MICROLITHOGRAPHY XXXIII (2021)
Cited1Views0Bibtex
1
0
Enhancing Model Accuracy And Calibration Efficiency With Image Based Pattern Selection Using Machine Learning Techniques
Ren-Cheng Sun, Dae-Kwon Kang, Chester Jia,Meng Liu, De-Bao Shao,Young-Seok Kim, Jangho Shin,Simmons Mark,Qian Zhao,Mu Feng,Yiqiong Zhao, Shibing Wang,
OPTICAL MICROLITHOGRAPHY XXXIV (2021)
Cited2Views0Bibtex
2
0
Memory OPO improvement using novel target design
Eitan Hajaj,Honggoo Lee,Chanha Park,Sang-Ho Lee,Dongyoung Lee,Dohwa Lee,Dongsoo Kim,Sanghuck Jeon,Dongsub Choi, Eltsafon Ashwal,Chen Dror,Raviv Yohanan,
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 1161137
Cited0Views0Bibtex
0
0
On-Product Focus Monitoring And Control For Immersion Lithography In 3d-Nand Manufacturing
Amine Lakcher, Ahmed Zayed, Jennifer Shumway, Jan-Pieter Van Delft, Gratiela Isai, Ruxandra Mustata, Arno Van Den Brink, Taeddy Kim, Jay Jung, Yong-Sik Shin, Soo-Kyung Lee, Paul Bocker,
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
Cited1Views0Bibtex
1
0
Opo Residuals Reduction With Imaging Metrology Color Per Layer Mode
Shlomit Katz,Honggoo Lee,Dongyoung Lee, Jinsoo Kim, Jaesun Woo,Chunsoo Kang,Chanha Park,Dohwa Lee,Seongjae Lee,Sanghuck Jeon,Dongsub Choi,Anna Golotsvan,
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
Cited4Views0Bibtex
4
0
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