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$1.62\mu \mathrm{m}$ Global Shutter Quantum Dot Image Sensor Optimized for Near and Shortwave Infrared

J. S. Steckel,E. Josse, A. G. Pattantyus-Abraham,M. Bidaud,B. Mortini, H. Bilgen, O. Arnaud, S. Allegret-Maret, F. Saguin, L. Mazet,S. Lhostis, T. Berger,

2021 IEEE International Electron Devices Meeting (IEDM)pp.23.4.1-23.4.4, (2021)

引用15浏览0EIWOS引用

Grayscale lithography process study applied to zero-gap microlenses for sub-2μm CMOS image sensors

Stephanie Audran,Jerome Vaillant,Vincent Farys,Flavien Hirigoyen, E Huss,B Mortini, C Cowache,Ludovic Berthier,E Mortini, J Fantuz, O Arnaud,Linda Depoyan,

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVII, PTS 1 AND 2（2010）

引用4浏览0引用

High Index Spin-on Photosensitive Material and Process Optimization for Image Sensor Devices

B. Mortini,C. Aumont,J.-P. Reynard,E. Mortini,A. Crocherie,A. Hirigoen,J. Vaillant

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY（2009）

引用0浏览0引用

Impact of HBr and Ar cure plasma treatments on 193nm photoresists

Arnaud Bazin,Erwine Pargon,X Mellhaoui,Damien Perret,B Mortini,Olivier Joubert

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2（2008）

引用22浏览0引用

Resist and BARC outgassing measured by TD-GCMS: investigation during the exposure or the bake steps of the lithographic process

Raluca Tiron,Claire Sourd,Herve Fontaine,Sylviane Cetre,B Mortini

PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE) (2007): 1-9

引用2浏览0EIWOS引用

Resist evaluation for contact hole patterning with thermal flow process

Raluca Tiron, C Petitdidier,Claire Sourd, D De Simone, Gina Cotti, Elisabetta Annoni,B Mortini

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV（2007）

引用0浏览0引用

Leaching mechanisms in immersion lithography with or without top coat

S. Gaugiran,R. Feilleux,C. Sourd,S. Warrick,V. Farys,D. Cruau,M. Benndorf,B. Mortini

Microelectronic Engineeringno. 5-8 (2007): 1054-1057

引用11浏览0EI引用

Mechanical dynamical analysis of ultra thin resist films for microlithography applications

C Petitdidier,Raluca Tiron,S Derrough,Claire Sourd, L Koscianski,B Mortini

Proceedings of SPIE（2007）

引用1浏览0引用

Evaluating resist degradation during reactive ion oxide etching using 193 nm model resist formulations

Michael J May,B Mortini,Claire Sourd,Damien Perret, D W Chung,George G Barclay,Cyril Brochon,Georges Hadziioannou

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2 (2006): U350-U357

引用4浏览0引用

Study of dynamical formation and shape of microlenses formed by the reflow method

Stephanie Audran, Bruno Faure,B Mortini,C Aumont,Raluca Tiron, C Zinck, Y Sanchez, C Fellous, J L Regolini,J P Reynard,Guy Schlatter, Georges Hadziioannou

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2 (2006): U1616-U1625

引用24浏览0引用

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