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个人简介
Arun K. Prasad received the B.Tech. degree in chemical and electrochemical engineering from the Central Electrochemical Research Institute, Karaikudi, India, in 2000, and the M.S. degree and the Ph.D. degree in materials science and engineering from the State University of New York at Stony Brook, USA, in 2002 and 2005, respectively. He is currently working as a Scientific Officer with the Surface and Nanoscience Division, Indira Gandhi Centre for Atomic Research, Kalpakkam, India. His research interests are in the area of fabrication, characterization, and testing of semiconductor metal oxide-based thin films and nanostructures for gas sensing applications.
研究兴趣
论文共 131 篇作者统计合作学者相似作者
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JOURNAL OF ALLOYS AND COMPOUNDS (2024): 172726-172726
Scientific reportsno. 1 (2024): 14462-14462
Journal of Opticspp.1-15, (2024)
JOURNAL OF ELECTRONIC MATERIALSno. 6 (2023): 4045-4056
Journal of Cluster Scienceno. 3 (2023): 1-12
Materials Today: Proceedings (2022): 1209-1213
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作者统计
#Papers: 114
#Citation: 2159
H-Index: 27
G-Index: 43
Sociability: 6
Diversity: 1
Activity: 1
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