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Research Interests

Papers共 16 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
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合作机构
Machine learning for Tool Induced Shift (TIS) reduction: an HVM case study
Boaz Ophir,Udi Shusterman,Anna Golotsvan,Cindy Kato,Masanobu Hayashi, Richika Kato, Tomohiro Goto, Taketo Kuriyama, Manabu Miyake, Yasuki Takeuchi,Hiroyuki Mizuochi
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 23-29
Cited2Views0Bibtex
2
0
Accuracy enhancement in imaging-based overlay metrology by optimizing measurement conditions per layer
Shlomit Katz,Yoav Grauer,Raviv Yohanan,Xiaolei Liu, Daria Negri,Anna Golotsvan
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 675-684
Cited1Views0Bibtex
1
0
Opo Residuals Reduction With Imaging Metrology Color Per Layer Mode
Shlomit Katz,Honggoo Lee,Dongyoung Lee, Jinsoo Kim, Jaesun Woo,Chunsoo Kang,Chanha Park,Dohwa Lee,Seongjae Lee,Sanghuck Jeon,Dongsub Choi,Anna Golotsvan,
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
Cited4Views0Bibtex
4
0
Machine learning for modeled-TIS and overlay reduction
Shlomit Katz,Boaz Ophir,Udi Shusterman,Anna Golotsvan, Liran Yerushalmi,Efi Megged,Yoav Grauer, Jian Zhang, Alimei Shih,Shi-Ming Wei, Judith Yep, Fiona Leung,
Metrology, Inspection, and Process Control for Microlithography XXXIV (2020)
Cited1Views0Bibtex
1
0
Opo Residuals Improvement With Imaging Metrology For 3d Nand
Shlomit Katz,Anna Golotsvan,Yoav Grauer,Efi Megged,Greg Gray, Fiona (Shuk-Fan) Leung, Pek Beng Ong,Shi Lei, Jeremy (Shi-Ming) Wei, Wayne (Wei) Zhou,Linfei Gao
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
Cited1Views0Bibtex
1
0
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Author Statistics

#Papers: 5

#Citation: 3

H-Index: 1

G-Index: 1

Sociability: 4

Diversity: 0

Activity: 0

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