基本信息
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Bio
Anabela Veloso received the M.Sc. in applied physics engineering from the Instituto Superior Técnico (IST), Technical University of Lisbon, Portugal, in 1996, and the Ph.D. degree from INESC-IST, Portugal, in 2002. Until 2001, she worked for the Ph.D. studies on advanced magnetic read heads.
She received an Internship at Storage Technology Corporation, Louisville, CO, USA, in 2000. Since 2001, she has been with imec, Leuven, Belgium, where she is currently a Principal Engineer. She has authored or coauthored more than 200 papers published in peer-reviewed international conference proceedings and technical journals. She was an IEDM Process and Manufacturing Technology Committee Member from 2014 to 2015. Her current research interests include advanced CMOS device physics, characterization, and technology, leading the gate-all-around nanowires project from the Imec Core CMOS Logic Program.
Research Interests
Papers共 296 篇Author StatisticsCo-AuthorSimilar Experts
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Halil Kukner,Gioele Mirabelli, Sheng Yang, Yun Zhou,Alexander Makarov, Yang Xiang,Juergen Boemmels,Anabela Veloso,Odysseas Zografos,Pieter Weckx,Julien Ryckaert,Geert Hellings
DTCO and Computational Patterning III (2024)
ECS Transactionsno. 2 (2024): 13-24
Vincent Brissonneau, Il Gyo Koo, Maryam Hosseini,Dmitry Batuk,Anabela Veloso,Geert Mannaert,Frédéric Lazzarino
Advanced Etch Technology and Process Integration for Nanopatterning XIII (2024)
N. Horiguchi,H. Mertens,R. Ritzenthaler, S. Subramanian,P. Weckx,P. Schuddinck,A. Veloso, S. Yang,K. Serbulova,J. Ryckaert
2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA)pp.1-2, (2024)
IEEE Transactions on Electron Devicesno. 99 (2024): 1-6
IEEE TRANSACTIONS ON ELECTRON DEVICESno. 4 (2024): 2278-2283
Journal of Integrated Circuits and Systemsno. 1 (2024): 1-8
ECS transactionsno. 33 (2023): 1862-1862
IEEE Transactions on Electron Devicesno. 1 (2023): 254-260
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)
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Author Statistics
#Papers: 285
#Citation: 3285
H-Index: 28
G-Index: 42
Sociability: 7
Diversity: 3
Activity: 19
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