基本信息
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Bio
Alexander Nichau received the Diploma in physics from the University of Cologne, Cologne, Germany, in 2009, where he worked on superconducting tunnel diodes and surface nitridation. He is currently working toward the Ph.D. degree at the Peter Gruenberg Institute 9 (PGI-9-IT), Forschungszentrum Jülich, Jülich, Germany.
He joined Forschungszentrum Jülich in 2009. His current research interest includes the integration of higher-$k$/metal gate into complementary metal–oxide–semiconductor, i.e., the electrical characterization of ultrathin-body silicon-on-insulator devices.
Research Interests
Papers共 30 篇Author StatisticsCo-AuthorSimilar Experts
By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
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Ultimate Integration Siliconpp.98-101, (2013)
Energy Efficient Electronic Systemspp.1-2, (2013)
International Conference on Ultimate Integration on Siliconpp.97-100, (2013)
A. Nichau, A. Schaefer,L. Knoll,S. Wirths,T. Schram,L. -A. Ragnarsson, J. Schubert,P. Bernardy,M. Luysberg,A. Besmehn,U. Breuer,D. Buca,
MICROELECTRONIC ENGINEERING (2013)
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Author Statistics
#Papers: 27
#Citation: 496
H-Index: 10
G-Index: 22
Sociability: 5
Diversity: 1
Activity: 0
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